JPH0290663U - - Google Patents

Info

Publication number
JPH0290663U
JPH0290663U JP16903488U JP16903488U JPH0290663U JP H0290663 U JPH0290663 U JP H0290663U JP 16903488 U JP16903488 U JP 16903488U JP 16903488 U JP16903488 U JP 16903488U JP H0290663 U JPH0290663 U JP H0290663U
Authority
JP
Japan
Prior art keywords
ionization
vacuum container
heater
gas
gas introduction
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP16903488U
Other languages
English (en)
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP16903488U priority Critical patent/JPH0290663U/ja
Publication of JPH0290663U publication Critical patent/JPH0290663U/ja
Pending legal-status Critical Current

Links

Landscapes

  • Physical Vapour Deposition (AREA)
JP16903488U 1988-12-27 1988-12-27 Pending JPH0290663U (en])

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16903488U JPH0290663U (en]) 1988-12-27 1988-12-27

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16903488U JPH0290663U (en]) 1988-12-27 1988-12-27

Publications (1)

Publication Number Publication Date
JPH0290663U true JPH0290663U (en]) 1990-07-18

Family

ID=31458739

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16903488U Pending JPH0290663U (en]) 1988-12-27 1988-12-27

Country Status (1)

Country Link
JP (1) JPH0290663U (en])

Similar Documents

Publication Publication Date Title
JPH05331640A (ja) イオン化蒸着装置
JPS56139673A (en) Manufacture of lead coat
JPH0290663U (en])
JPS62199767A (ja) イオンプレ−テイング装置
EP0029747A1 (en) An apparatus for vacuum deposition and a method for forming a thin film by the use thereof
JP3401365B2 (ja) プラズマ発生装置およびイオンプレーティング装置
JP2000008159A (ja) 同軸型真空アーク蒸着源を用いた蒸着装置
JPS62180064A (ja) ア−ク溶解法による管内面の被覆法
JPS62101860U (en])
JPS5739169A (en) Preparation of thin film vapor deposited object
JP3330159B2 (ja) ダイナミックミキシング装置
JPH0322063U (en])
JPS61113763A (ja) 電子衝撃型蒸着装置
JPS63216967A (ja) 薄膜形成装置
JPS6318056A (ja) ア−ク式蒸発源
JPS6251736U (en])
JPH06116719A (ja) 高周波イオンプレーティング装置
JP3026145B2 (ja) プラズマ処理方法及び装置
JPS61279115A (ja) 薄膜形成装置
JPH0375360A (ja) 薄膜形成装置
JPH02194165A (ja) イオンプレーティングにおけるイオン化方法およびイオンプレーティング装置
JPH0747819B2 (ja) プラズマフラッシュ蒸着方法および装置
JPH0784652B2 (ja) イオンプレ−テイング装置
JPS57171666A (en) Thin film vapor-deposition device
JPS61187373U (en])